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MG Chemicals 418 Positive Photo Resist Developer

Part No:MG418-500ML
$14.75

Availability: In stock

Quick overview

For removing exposed resist during the positive photofabrication process
Qty:

For removing exposed resist during the positive photofabrication process.

Dissolves exposed photo resist Concentrated formulation - dilute one part developer to ten parts water

For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)

Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .

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SKU MG418-500ML
Weight (lbs) 1.3
Free Shipping No
Brand MG Chemicals
Part No 779008418505
Manufacturer MG Chemicals
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