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MG Chemicals 418 Positive Photo Resist Developer

Part No:MG418-500ML
$13.65

Availability: In stock

Quick overview

For removing exposed resist during the positive photofabrication process
Qty:

    For removing exposed resist during the positive photofabrication process.

    Dissolves exposed photo resist Concentrated formulation - dilute one part developer to ten parts water

    For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)

    Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .

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    SKUMG418-500ML
    Weight (lbs)1.3000
    Free ShippingNo
    BrandMG Chemicals
    Part No779008418505
    ManufacturerMG Chemicals
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